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<record>
  <title>The Study of Voltage Shift in the Post-Radiation Response</title>
  <journal>Electronic Devices</journal>
  <author>Milic M. Pejovic, Momcilo M. Pejovic and Nikola T. NeÅ¡ic</author>
  <volume>12</volume>
  <issue>1</issue>
  <year>2023</year>
  <doi>https://doi.org/10.6025/ed/2023/12/1/15-21</doi>
  <url>https://www.dline.info/ed/fulltext/v12n1/edv12n1_3.pdf</url>
  <abstract>The voltage shift in the gamma-irradiation and post irradiation response was studied with elevated temperature. The gate polarization of 0, 2.5 and 5V are used with gate oxide thickness. The relation between ï„VT and absorbed dose was observed. The ï„VT decrease while the zero-gate polarization during irradiation and 100 nm RADFETs ï„VT remains approximately during the annealing at room temperature. The decrease of ï„VT is associated with the continued annealing at 120oC. Thus, the fluctuations and various impact of the gate polarization is well addressed in this work.</abstract>
</record>
